Seastar’s R&D department has the ability to create 3D models to demonstrate how certain molecules will interact with surfaces. This capability allows us to quickly develop solutions for the semiconductor thin film deposition market. Below is an example of our modeling capabilities. This video shows the simulation of silicon precursors and catalyst interactions growing on a silicon oxide surface. If you would like to find out more about our ability to model solutions for your semiconductor thin film deposition issues, please contact our customer service department at email@example.com.