Gas Phase In-Situ Deposition Chamber Cleaning

Seastar is developing solutions for the semiconductor thin film deposition market. We have a new etching chemistry that allows for the rapid in-situ cleaning of MOCVD reactors for LED and power device manufacture. This product increases the reactor output and decreases component wear and downtime that occurs while cleaning these reactors. Please contact us today at if you would like more information about this product.

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