Device Structure Etching

Gray Disc (with wafer - website1)
Seastar has developed a new etchant molecule that allows in-situ thermal etching without the use of fluorine.  This product provides a significant advantage over current products as the etching can be carried out thermally or with plasma for low temperature etching work.  Also, this product has been designed to allow true thermal ALE (atomic layer etching) to be implemented for selective metals. If you would like more information about this product, please contact our customer service team at